It is important to monitor manufacturing processes in order to improve product quality and reduce production cost. Statistical Process Control (SPC) is the most commonly used method for process monitoring, in particular making distinctions between variations attributed to normal process variability to those caused by ‘special causes’. Most SPC and multivariate SPC (MSPC) methods are parametric in that they make assumptions about the distributional properties and autocorrelation structure of in-control process parameters, and, if satisfied, are effective in managing false alarms/-positives and false- negatives. However, when processes do not satisfy these assumptions, the effectiveness of SPC methods is compromised. Several non-parametric control charts based on sequential ranks of data depth measures have been proposed in the literature, but their development and implementation have been rather slow in industrial process control. Several non-parametric control charts based on machine learning principles have also been proposed in the literature to overcome some of these limitations. However, unlike conventional SPC methods, these non-parametric methods require event data from each out-of-control process state for effective model building. The paper presents a new non-parametric multivariate control chart based on kernel distance that overcomes these limitations by employing the notion of one-class classification based on support vector principles. The chart is non-parametric in that it makes no assumptions regarding the data probability density and only requires ‘normal’ or in-control data for effective representation of an in-control process. It does, however, make an explicit provision to incorporate any available data from out-of-control process states. Experimental evaluation on a variety of benchmarking datasets suggests that the proposed chart is effective for process mo
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