Article thumbnail
Location of Repository

AN UNUSUAL ADSORPTION SITE FOR METHOXY ON AL(111) SURFACES

By 

Abstract

The adsorption site of the methoxy (CH3O) species on Al(111) bas been investigated using the technique of normal incidence standing x-ray wavefield absorption. BY recording the x-ray absorption of the O atom of this species at both the (111) and (111)-normal incidence Bragg scattering conditions (at normal and 70.5-degrees incidence to the surface) the adsorption site was obtained by simple real-space triangulation. The species is adsorbed in a three-fold symmetry hollow site with an O-Al layer spacing of 0.70+/-0.10 angstrom, (as found for chemisorbed oxygen), but the site occupied is the HCP hollow directly above an Al atom in the second layer, and not the FCC site (above an Al atom in the third layer) which is occupied by chemisorbed oxygen. This appears to be the first example of an adsorbate with a clear preference for this HCP hollow site on an otherwise clean FCC (111) surface

Topics: QC
Publisher: IOP PUBLISHING LTD
OAI identifier: oai:wrap.warwick.ac.uk:21996
Sorry, our data provider has not provided any external links therefore we are unable to provide a link to the full text.

Suggested articles


To submit an update or takedown request for this paper, please submit an Update/Correction/Removal Request.