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Investigation of Influence of Enviromental Conditions to Surface of Antireflective Thin Films

By Janīna Sētiņa, Gundars Mežinskis and vasilijs Akishins


This article gives an overview of anti-reflection characterization of SiO2 and TiO2 multilayer thin films on flat glass substrate obtained by magnetron sputtering. Optical properties (refractive index, reflectance, transmission) were determined, and discussed in connection with surface morphology of films studied by means of atomic force microscopy

Topics: anti-reflectance thin films, magnetron sputtering, optical properties
Publisher: China Triumph International Engineering Co., Ltd
OAI identifier: oai:ortus.rtu.lv:12800
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