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Redistribution of Implanted Noble Gas Atoms by Self-Interstitials in Molybdenym and Nickel

By A. van Veen, W.Th.M. Buters, T.R. Armstrong, B. Nielsen, K.T. Westerduin, L.M. Caspers and J.Th.M. De Hosson

Abstract

Thermal Desorption Spectrometry (TDS) has been used to study the interactions of Self-Interstitial Atoms (SIA) with noble gas associated defects in Mo and Ni. Low energy heavy ion bombardment (100 eV Ar and Xe for Mo; 50 eV Kr for Ni) has been used to introduce SIA into the metals. Interactions have been observed of SIA with HenV (V = Vacancy; n = 1,..., 7) and ArVn (n = 1, 2, ···) in Mo, and with NeV in Ni. In all these cases the defects were found to be reduced by SIA capture. Substitutional atoms were converted into (at 300 K) mobile interstitials. For Kr in Ni no capture of SIA was observed. The results and their possible consequences for noble gas agglomeration in noble gas irradiated metals are discussed.

Year: 1983
OAI identifier: oai:ub.rug.nl:dbi/4551a710f0feb
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