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Monitoring of the morphologic reconstruction of deposited ablation products in laser irradiation of silicon

By Vlasova M., Aguilar Márquez P.A., Reséndiz-González M.C., Kakazey M., Stetsenko V., Tomila T. and Ragulya A.

Abstract

Using electron microscopy, atomic force microscopy, X-ray microanalysis, and IR spectroscopy, it was established that, in the regime of continuous laser irradiation of silicon at P = 170 W in different gaseous atmospheres with an oxygen impurity, SiOx composite films with a complex morphology form. The main components of ablation products are clusters that form during flight of ablation products and as a result of separation of SiOx-clusters from the zone of the irradiation channel. The roughness and density of the films depend on the heating temperature of the target surface and the type of deposited clusters

Topics: silicon, laser irradiation, argon, nitrogen, oxygen, SiOx films, Chemistry, QD1-999, Science, Q, DOAJ:Chemistry (General), DOAJ:Chemistry, Chemical technology, TP1-1185
Publisher: International Institute for the Science of Sintering, Beograd
Year: 2008
DOI identifier: 10.2298/SOS0801069V
OAI identifier: oai:doaj.org/article:06f9f0a933d64457af2931caca3f1003
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