Abstract

ma,b stitute ineeri slurr 2 or ile th tials o ate en 948 A ed Ju Ru CMP was studied with a laboratory-scale polishing instru- or relatively soft Ru oxide film appears to form only at low pH 2, whereas a harder Ru oxide film appears to form at higher pH

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oai:CiteSeerX.psu:10.1.1.907.7321Last time updated on 11/1/2017

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