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Identification of Optimal Doses for Device Quality Thin-Film and Standard Simox Structures Formed by Low (50keV, 70keV or 90keV) or High (200keV) Energy Oxygen Implantation

By C. D. Marsh, G. R. Booker, A. Nejim, L. F. Giles, P. L. F. Hemment, Y. Li, R. J. Chater, J. A. Kilner, S. Wainwright and S. Hall


<p>Abstract not available.</p

Year: 1992
OAI identifier:

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