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Hybrid Cu-adhesive Wafer Bonding

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Abstract

A reliability evaluation of a 300-mm-compatible 3DI process is presented. The structure has tungsten through-Si-vias (TSVs), a hybrid Cu/adhesive bonding interface, and a post Si-thinning Cu BEOL. The interface bonding strength, deep thermal cycles test, temperature and humidity test, and ambient permeation oxidation all show favorable results, indicating the suitability of this technology for VLSI applications

Year: 2014
OAI identifier: oai:CiteSeerX.psu:10.1.1.467.3980
Provided by: CiteSeerX
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