Article Takedown/Update Request

This is an update request for the document High density fluorocarbon etching of silicon in an inductively coupled plasma: Mechanism of etching through a thick steady state fluorocarbon layer by T. E. F. M. Standaert, M. Schaepkens, N. R. Rueger, P. G. M. Sebel, G. S. Oehrlein and J. M. Cook

Your paper was deposited in Crossref and appears online at https://pure.tue.nl/ws/files/1401559/1008625842989344.pdf
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